Filtro UV K&F Concept Nano-X MRC de ultra baja reflexión 55mm

The K&F Concept Nano-X MRC UV Filter is a high-performance lens accessory designed to protect your lens while enhancing image quality. Featuring advanced Nano-X Multi-Resistant Coating (MRC) with 28 layers, it achieves over 99.6% light transmittance and less than 0.3% reflection, ensuring ultra-low reflection and superior clarity. The filter is crafted from Japanese AGC optical glass and an aviation aluminum alloy frame, offering durability and a slim profile of 3.3 mm. It is water-resistant, oil-resistant, scratch-resistant, and anti-static, making it ideal for outdoor and studio photography. The double-threaded design allows for stacking additional filters or lens caps.

Advantages

Ultra-low reflection reduces glare and flare, improving contrast and color accuracy. The multi-resistant coating protects against water, oil, scratches, and static, ensuring easy cleaning and long-lasting performance. The ultra-slim frame prevents vignetting on wide-angle lenses.

Suitable for

• Photographers seeking lens protection without compromising image quality
• Outdoor and landscape photography to reduce atmospheric haze
• Studio work requiring high light transmission and minimal reflections

Key specifications

• Filter Type: UV Filter
• Filter Diameter: 55 mm
• Coating: Nano-X Multi-Resistant Coating (MRC), 28 layers double-sided
• Light Transmittance: >99.6%
• Reflection Rate: <0.3%
• Glass Material: Japanese AGC Optical Glass
• Frame Material: Aviation Aluminum Alloy
• Frame Thickness: 3.3 mm
• Thread Type: Double-threaded (front and rear)
• Water, Oil, Scratch, and Static Resistant

Recommendations

For optimal performance, pair this UV filter with a lens hood to minimize stray light. Clean with a microfiber cloth to maintain coating integrity. Ideal for both amateur and professional photographers.